Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Dislocation contrast in cathodoluminescence and electron-beam induced current maps on GaN(0 0 0 1). / Sabelfeld, Karl K.; Kaganer, Vladimir M.; Pfüller, Carsten и др.
в: Journal Physics D: Applied Physics, Том 50, № 40, 405101, 11.09.2017.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Dislocation contrast in cathodoluminescence and electron-beam induced current maps on GaN(0 0 0 1)
AU - Sabelfeld, Karl K.
AU - Kaganer, Vladimir M.
AU - Pfüller, Carsten
AU - Brandt, Oliver
N1 - Publisher Copyright: © 2017 IOP Publishing Ltd.
PY - 2017/9/11
Y1 - 2017/9/11
N2 - We theoretically analyze the contrast observed at the outcrop of a threading dislocation at the GaN(0 0 0 1) surface in cathodoluminescence and electron-beam induced current maps. We consider exciton diffusion and recombination including finite recombination velocities both at the planar surface and at the dislocation. Formulating the reciprocity theorem for this general case enables us to provide a rigorous analytical solution of this diffusion-recombination problem. The results of the calculations are applied to an experimental example to determine both the exciton diffusion length and the recombination strength of threading dislocations in a free-standing GaN layer with a dislocation density of 6 × 105 cm-2.
AB - We theoretically analyze the contrast observed at the outcrop of a threading dislocation at the GaN(0 0 0 1) surface in cathodoluminescence and electron-beam induced current maps. We consider exciton diffusion and recombination including finite recombination velocities both at the planar surface and at the dislocation. Formulating the reciprocity theorem for this general case enables us to provide a rigorous analytical solution of this diffusion-recombination problem. The results of the calculations are applied to an experimental example to determine both the exciton diffusion length and the recombination strength of threading dislocations in a free-standing GaN layer with a dislocation density of 6 × 105 cm-2.
KW - cathodoluminescence
KW - dislocation
KW - EBIC
KW - GaN
KW - RECOMBINATION
KW - SEMICONDUCTOR
KW - THREADING DISLOCATIONS
KW - THEORETICAL DESCRIPTION
KW - LIGHT-EMITTING-DIODES
KW - CHARGE-COLLECTION
KW - GAN
KW - SEM
KW - DIFFUSION LENGTH
KW - LOCALIZED DEFECTS
UR - http://www.scopus.com/inward/record.url?scp=85029905778&partnerID=8YFLogxK
U2 - 10.1088/1361-6463/aa85c8
DO - 10.1088/1361-6463/aa85c8
M3 - Article
AN - SCOPUS:85029905778
VL - 50
JO - Journal Physics D: Applied Physics
JF - Journal Physics D: Applied Physics
SN - 0022-3727
IS - 40
M1 - 405101
ER -
ID: 9055809