Standard

Diffusion of Rb atoms in paraffin-coated resonant vapor cells. / Atutov, Sergey N.; Benimetskiy, Fedor A.; Plekhanov, Alexander I. и др.

в: European Physical Journal D, Том 71, № 1, 12, 19.01.2017.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Atutov, SN, Benimetskiy, FA, Plekhanov, AI, Sorokin, VA & Yakovlev, AV 2017, 'Diffusion of Rb atoms in paraffin-coated resonant vapor cells', European Physical Journal D, Том. 71, № 1, 12. https://doi.org/10.1140/epjd/e2016-70347-6

APA

Atutov, S. N., Benimetskiy, F. A., Plekhanov, A. I., Sorokin, V. A., & Yakovlev, A. V. (2017). Diffusion of Rb atoms in paraffin-coated resonant vapor cells. European Physical Journal D, 71(1), [12]. https://doi.org/10.1140/epjd/e2016-70347-6

Vancouver

Atutov SN, Benimetskiy FA, Plekhanov AI, Sorokin VA, Yakovlev AV. Diffusion of Rb atoms in paraffin-coated resonant vapor cells. European Physical Journal D. 2017 янв. 19;71(1):12. doi: 10.1140/epjd/e2016-70347-6

Author

Atutov, Sergey N. ; Benimetskiy, Fedor A. ; Plekhanov, Alexander I. и др. / Diffusion of Rb atoms in paraffin-coated resonant vapor cells. в: European Physical Journal D. 2017 ; Том 71, № 1.

BibTeX

@article{abf16405e39e43e7b629459977ba2fcd,
title = "Diffusion of Rb atoms in paraffin-coated resonant vapor cells",
abstract = "We present the results of a study of the diffusion of Rb atoms in paraffin-coatedresonant vapor cells. We have modeled the Rb diffusion both in the cell and in thecoating, assuming that the main loss of Rb atoms is due to the physical absorption of theatoms by the glass substrate. It is demonstrated that the equilibrium of atomic density inthe cell is a monotonic function of the thickness of the paraffin coating: the densityincreases with an increase in the thickness of the coating. The diffusion coefficient forrubidium in paraffin thin films has been determined to be equal to 5 × 10-7 cm2/s. The results of theexperiment might provide for a better understanding of the processes involved in theinteraction of alkali atoms with a paraffin coating and atomic diffusion in resonant vaporcells.",
keywords = "Atomic and Molecular Collisions, GASES, FILM, LIGHT",
author = "Atutov, {Sergey N.} and Benimetskiy, {Fedor A.} and Plekhanov, {Alexander I.} and Sorokin, {Vladimir A.} and Yakovlev, {Alexander V.}",
year = "2017",
month = jan,
day = "19",
doi = "10.1140/epjd/e2016-70347-6",
language = "English",
volume = "71",
journal = "European Physical Journal D",
issn = "1434-6060",
publisher = "Springer Nature",
number = "1",

}

RIS

TY - JOUR

T1 - Diffusion of Rb atoms in paraffin-coated resonant vapor cells

AU - Atutov, Sergey N.

AU - Benimetskiy, Fedor A.

AU - Plekhanov, Alexander I.

AU - Sorokin, Vladimir A.

AU - Yakovlev, Alexander V.

PY - 2017/1/19

Y1 - 2017/1/19

N2 - We present the results of a study of the diffusion of Rb atoms in paraffin-coatedresonant vapor cells. We have modeled the Rb diffusion both in the cell and in thecoating, assuming that the main loss of Rb atoms is due to the physical absorption of theatoms by the glass substrate. It is demonstrated that the equilibrium of atomic density inthe cell is a monotonic function of the thickness of the paraffin coating: the densityincreases with an increase in the thickness of the coating. The diffusion coefficient forrubidium in paraffin thin films has been determined to be equal to 5 × 10-7 cm2/s. The results of theexperiment might provide for a better understanding of the processes involved in theinteraction of alkali atoms with a paraffin coating and atomic diffusion in resonant vaporcells.

AB - We present the results of a study of the diffusion of Rb atoms in paraffin-coatedresonant vapor cells. We have modeled the Rb diffusion both in the cell and in thecoating, assuming that the main loss of Rb atoms is due to the physical absorption of theatoms by the glass substrate. It is demonstrated that the equilibrium of atomic density inthe cell is a monotonic function of the thickness of the paraffin coating: the densityincreases with an increase in the thickness of the coating. The diffusion coefficient forrubidium in paraffin thin films has been determined to be equal to 5 × 10-7 cm2/s. The results of theexperiment might provide for a better understanding of the processes involved in theinteraction of alkali atoms with a paraffin coating and atomic diffusion in resonant vaporcells.

KW - Atomic and Molecular Collisions

KW - GASES

KW - FILM

KW - LIGHT

UR - http://www.scopus.com/inward/record.url?scp=85009932557&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/638ed39d-b9ef-389e-bf11-61ee53701a8d/

U2 - 10.1140/epjd/e2016-70347-6

DO - 10.1140/epjd/e2016-70347-6

M3 - Article

AN - SCOPUS:85009932557

VL - 71

JO - European Physical Journal D

JF - European Physical Journal D

SN - 1434-6060

IS - 1

M1 - 12

ER -

ID: 10315977