Standard

Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach. / Dolbnya, I. P.; Bataev, I. A.; Rakshun, Ya V. и др.

в: Journal of Surface Investigation, Том 17, № Suppl 1, 12.2023, стр. S78-S89.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Dolbnya, IP, Bataev, IA, Rakshun, YV, Chernov, VA, Khomyakov, YV, Gorbachev, MV, Chkhalo, NI, Krasnorutsky, DA, Naumkin, VS, Sklyarov, AN, Mezentsev, NA & Korsunsky, AM 2023, 'Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach', Journal of Surface Investigation, Том. 17, № Suppl 1, стр. S78-S89. https://doi.org/10.1134/S1027451023070091

APA

Dolbnya, I. P., Bataev, I. A., Rakshun, Y. V., Chernov, V. A., Khomyakov, Y. V., Gorbachev, M. V., Chkhalo, N. I., Krasnorutsky, D. A., Naumkin, V. S., Sklyarov, A. N., Mezentsev, N. A., & Korsunsky, A. M. (2023). Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach. Journal of Surface Investigation, 17(Suppl 1), S78-S89. https://doi.org/10.1134/S1027451023070091

Vancouver

Dolbnya IP, Bataev IA, Rakshun YV, Chernov VA, Khomyakov YV, Gorbachev MV и др. Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach. Journal of Surface Investigation. 2023 дек.;17(Suppl 1):S78-S89. doi: 10.1134/S1027451023070091

Author

Dolbnya, I. P. ; Bataev, I. A. ; Rakshun, Ya V. и др. / Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach. в: Journal of Surface Investigation. 2023 ; Том 17, № Suppl 1. стр. S78-S89.

BibTeX

@article{6d6c16cb7def4948a5671721cdd9e91c,
title = "Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach",
abstract = "We present the conceptual design of a universal materials-research beamline based on the undulator of a fourth-generation synchrotron-radiation source. The distinctive feature of the beamline is its capability to work with both spectrally narrow (ΔE/E ~ 10–4) and relatively broad, high-intensity radiation beams (5 × 10–2). The optical scheme enables rapid switching between diffraction, radiographic, and spectroscopic experimental methods while keeping the beam{\textquoteright}s position fixed on the test sample and varying the spot size of the radiation from 100 nm to 1 mm.",
keywords = "Kirkpatrick–Baez mirrors, Laue diffraction, X-ray diffraction, X-ray imaging, XAFS, double-mirror multilayer monochromator, extended undulator harmonics, in situ, materials science, quadruple-crystal monochromator, submicrometer focusing, synchrotron radiation",
author = "Dolbnya, {I. P.} and Bataev, {I. A.} and Rakshun, {Ya V.} and Chernov, {V. A.} and Khomyakov, {Yu V.} and Gorbachev, {M. V.} and Chkhalo, {N. I.} and Krasnorutsky, {D. A.} and Naumkin, {V. S.} and Sklyarov, {A. N.} and Mezentsev, {N. A.} and Korsunsky, {A. M.}",
note = "This work was supported by ongoing institutional funding. No additional grants to carry out or direct this particular research were obtained. Публикация для корректировки.",
year = "2023",
month = dec,
doi = "10.1134/S1027451023070091",
language = "English",
volume = "17",
pages = "S78--S89",
journal = "Journal of Surface Investigation",
issn = "1027-4510",
publisher = "Maik Nauka Publishing / Springer SBM",
number = "Suppl 1",

}

RIS

TY - JOUR

T1 - Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach

AU - Dolbnya, I. P.

AU - Bataev, I. A.

AU - Rakshun, Ya V.

AU - Chernov, V. A.

AU - Khomyakov, Yu V.

AU - Gorbachev, M. V.

AU - Chkhalo, N. I.

AU - Krasnorutsky, D. A.

AU - Naumkin, V. S.

AU - Sklyarov, A. N.

AU - Mezentsev, N. A.

AU - Korsunsky, A. M.

N1 - This work was supported by ongoing institutional funding. No additional grants to carry out or direct this particular research were obtained. Публикация для корректировки.

PY - 2023/12

Y1 - 2023/12

N2 - We present the conceptual design of a universal materials-research beamline based on the undulator of a fourth-generation synchrotron-radiation source. The distinctive feature of the beamline is its capability to work with both spectrally narrow (ΔE/E ~ 10–4) and relatively broad, high-intensity radiation beams (5 × 10–2). The optical scheme enables rapid switching between diffraction, radiographic, and spectroscopic experimental methods while keeping the beam’s position fixed on the test sample and varying the spot size of the radiation from 100 nm to 1 mm.

AB - We present the conceptual design of a universal materials-research beamline based on the undulator of a fourth-generation synchrotron-radiation source. The distinctive feature of the beamline is its capability to work with both spectrally narrow (ΔE/E ~ 10–4) and relatively broad, high-intensity radiation beams (5 × 10–2). The optical scheme enables rapid switching between diffraction, radiographic, and spectroscopic experimental methods while keeping the beam’s position fixed on the test sample and varying the spot size of the radiation from 100 nm to 1 mm.

KW - Kirkpatrick–Baez mirrors

KW - Laue diffraction

KW - X-ray diffraction

KW - X-ray imaging

KW - XAFS

KW - double-mirror multilayer monochromator

KW - extended undulator harmonics

KW - in situ

KW - materials science

KW - quadruple-crystal monochromator

KW - submicrometer focusing

KW - synchrotron radiation

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85186755305&origin=inward&txGid=5f977091bed723150a43e66c9b0a28cd

UR - https://www.mendeley.com/catalogue/78c0e5bc-522e-3642-b27c-1c3086d37222/

U2 - 10.1134/S1027451023070091

DO - 10.1134/S1027451023070091

M3 - Article

VL - 17

SP - S78-S89

JO - Journal of Surface Investigation

JF - Journal of Surface Investigation

SN - 1027-4510

IS - Suppl 1

ER -

ID: 59755142