Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering

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Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering. / Makarova, N. A.; Terentyev, V. S.; Vatnik, I. D.

в: JETP Letters, Том 122, № 11, 12.2025, стр. 772-776.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

BibTeX

@article{ae0fe380ba3544ae83f14c6a386262a5,

title = "Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering",

abstract = "A cylindrical microresonator based on standard silica optical fibers is a promising simple platform for creating nonlinear devices, but it requires high pump power to observe nonlinear effects. This paper examines the feasibility of magnetron sputtering thin films from silicon and silicon nitride layers with a high nonlinear refractive index. It is shown that during sputtering the Q-factor drops to 105 and 106 for silicon and silicon nitride films, respectively.",

author = "Makarova, {N. A.} and Terentyev, {V. S.} and Vatnik, {I. D.}",

note = "Makarova, N.A., Terentyev, V.S. & Vatnik, I.D. Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering. Jetp Lett. 122, 772–776 (2025). https://doi.org/10.1134/S0021364025608930 The work of N.A. Makarova and I.D. Vatnik was supported by the Ministry of Science and Higher Education of the Russian Federation (FSUS-2025-0010). The work of V.S. Terentyev was carried out within the framework of the state assignment of the Institute of Automation and Electrometry of the Siberian Branch of the Russian Academy of Sciences “Development of elements and study of the characteristics of laser and sensor systems based on structured fiber optic guides, microresonators, and hybrid circuits” (FWNG-2024-0015).",

year = "2025",

month = dec,

doi = "10.1134/S0021364025608930",

language = "English",

volume = "122",

pages = "772--776",

journal = "JETP Letters",

issn = "0021-3640",

publisher = "Общество с ограниченной ответственностью Международная академическая издательская компания {"}Наука/Интерпериодика{"}",

number = "11",

}

RIS

TY - JOUR

T1 - Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering

AU - Makarova, N. A.

AU - Terentyev, V. S.

AU - Vatnik, I. D.

N1 - Makarova, N.A., Terentyev, V.S. & Vatnik, I.D. Cylindrical Microresonators Based on Silicon and Silicon Nitride Fibers Fabricated by Magnetron Sputtering. Jetp Lett. 122, 772–776 (2025). https://doi.org/10.1134/S0021364025608930 The work of N.A. Makarova and I.D. Vatnik was supported by the Ministry of Science and Higher Education of the Russian Federation (FSUS-2025-0010). The work of V.S. Terentyev was carried out within the framework of the state assignment of the Institute of Automation and Electrometry of the Siberian Branch of the Russian Academy of Sciences “Development of elements and study of the characteristics of laser and sensor systems based on structured fiber optic guides, microresonators, and hybrid circuits” (FWNG-2024-0015).

PY - 2025/12

Y1 - 2025/12

N2 - A cylindrical microresonator based on standard silica optical fibers is a promising simple platform for creating nonlinear devices, but it requires high pump power to observe nonlinear effects. This paper examines the feasibility of magnetron sputtering thin films from silicon and silicon nitride layers with a high nonlinear refractive index. It is shown that during sputtering the Q-factor drops to 105 and 106 for silicon and silicon nitride films, respectively.

AB - A cylindrical microresonator based on standard silica optical fibers is a promising simple platform for creating nonlinear devices, but it requires high pump power to observe nonlinear effects. This paper examines the feasibility of magnetron sputtering thin films from silicon and silicon nitride layers with a high nonlinear refractive index. It is shown that during sputtering the Q-factor drops to 105 and 106 for silicon and silicon nitride films, respectively.

UR - https://www.scopus.com/pages/publications/105028308630

UR - https://www.elibrary.ru/item.asp?id=87243949

UR - https://www.mendeley.com/catalogue/287ee2b7-b2c9-3038-969b-cf03ff98d1b0/

U2 - 10.1134/S0021364025608930

DO - 10.1134/S0021364025608930

M3 - Article

VL - 122

SP - 772

EP - 776

JO - JETP Letters

JF - JETP Letters

SN - 0021-3640

IS - 11

ER -

ID: 74295359