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Blocking of dislocation propagation by faceted solid liquid interface during Ge crystal growth by the low thermal gradient Czochralski technique. / Kasimkin, P. V.; Kurus, A. F.; Shlegel, V. N. и др.
в: Journal of Crystal Growth, Том 531, 125375, 01.02.2020.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Blocking of dislocation propagation by faceted solid liquid interface during Ge crystal growth by the low thermal gradient Czochralski technique
AU - Kasimkin, P. V.
AU - Kurus, A. F.
AU - Shlegel, V. N.
AU - Vasiliev, Y. V.
AU - Podkopaev, O. I.
N1 - Publisher Copyright: © 2019 Elsevier B.V. Copyright: Copyright 2019 Elsevier B.V., All rights reserved.
PY - 2020/2/1
Y1 - 2020/2/1
N2 - The initial stage of germanium crystal growth by the low thermal gradient Czochralski technique of pulling from the melt (LTG CZ) has been studied in a series of experiments, in which the processes have been interrupted after pulling 6 mm in dia., 70–80 mm in length crystal rod and then up to 20 mm long a cone part. The axial gradients estimated from computer modelling were 2–2.5 K/cm. Crystals pulled in 〈1 1 1〉 direction with totally faceted interface were dislocation-free if facet formation was not disturbed. Crystals pulled along 〈1 0 0〉 under identical conditions, had rounded interface due to thermal roughens of (1 0 0) faces. In that case, the dislocation density was low, but not below ~102 cm−2.
AB - The initial stage of germanium crystal growth by the low thermal gradient Czochralski technique of pulling from the melt (LTG CZ) has been studied in a series of experiments, in which the processes have been interrupted after pulling 6 mm in dia., 70–80 mm in length crystal rod and then up to 20 mm long a cone part. The axial gradients estimated from computer modelling were 2–2.5 K/cm. Crystals pulled in 〈1 1 1〉 direction with totally faceted interface were dislocation-free if facet formation was not disturbed. Crystals pulled along 〈1 0 0〉 under identical conditions, had rounded interface due to thermal roughens of (1 0 0) faces. In that case, the dislocation density was low, but not below ~102 cm−2.
KW - A1. Computer simulation
KW - A1. Defects
KW - A2. Czochralski method
KW - A2. Growth from melt
KW - A2. LTG Cz
KW - B2. Semiconducting germanium
KW - LTG Cz
KW - Czochralski method
KW - Growth from melt
KW - Defects Computer simulation
KW - Semiconducting germanium
UR - http://www.scopus.com/inward/record.url?scp=85076257860&partnerID=8YFLogxK
U2 - 10.1016/j.jcrysgro.2019.125375
DO - 10.1016/j.jcrysgro.2019.125375
M3 - Article
AN - SCOPUS:85076257860
VL - 531
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
M1 - 125375
ER -
ID: 23057088