Atomic Layer Deposition Synthesis of thin Films of Vanadium Oxides in a Reducing Hydrogen Atmosphere

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Atomic Layer Deposition Synthesis of thin Films of Vanadium Oxides in a Reducing Hydrogen Atmosphere. / Voloshin, B. V.; Seleznev, V. A.; Golyashov, V. A.

в: Journal of Structural Chemistry, Том 65, № 10, 10.2024, стр. 2073-2087.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

BibTeX

@article{d51e65b2fa9347a3b6dec5e5f37c3d65,

title = "Atomic Layer Deposition Synthesis of thin Films of Vanadium Oxides in a Reducing Hydrogen Atmosphere",

abstract = "Abstract: The work considers the synthesis of thin films of vanadium oxides by plasma-enhanced atomic layer deposition (PE-ALD). A procedure is proposed to obtain thin films of amorphous vanadium dioxide. The hydrogen effect on the composition of deposited films during PE-ALD is analyzed. Hydrogen is shown to decrease the vanadium oxidation state in the deposited films and amorphize the structure. The mechanism of amorphization is discussed. The application of plasma enhancement promotes the hydrogen reducing activity. Calcination of films consisting of a mixture of vanadium oxides in hydrogen plasma enables the preparation of films of solely amorphous vanadium dioxide.",

keywords = "atomic layer deposition, thin films, vanadium oxides",

author = "Voloshin, {B. V.} and Seleznev, {V. A.} and Golyashov, {V. A.}",

note = "The work was supported by the Ministry of Science and Higher Education of the Russian Federation.",

year = "2024",

month = oct,

doi = "10.1134/S0022476624100160",

language = "English",

volume = "65",

pages = "2073--2087",

journal = "Journal of Structural Chemistry",

issn = "0022-4766",

publisher = "Springer GmbH & Co, Auslieferungs-Gesellschaf",

number = "10",

}

RIS

TY - JOUR

T1 - Atomic Layer Deposition Synthesis of thin Films of Vanadium Oxides in a Reducing Hydrogen Atmosphere

AU - Voloshin, B. V.

AU - Seleznev, V. A.

AU - Golyashov, V. A.

N1 - The work was supported by the Ministry of Science and Higher Education of the Russian Federation.

PY - 2024/10

Y1 - 2024/10

N2 - Abstract: The work considers the synthesis of thin films of vanadium oxides by plasma-enhanced atomic layer deposition (PE-ALD). A procedure is proposed to obtain thin films of amorphous vanadium dioxide. The hydrogen effect on the composition of deposited films during PE-ALD is analyzed. Hydrogen is shown to decrease the vanadium oxidation state in the deposited films and amorphize the structure. The mechanism of amorphization is discussed. The application of plasma enhancement promotes the hydrogen reducing activity. Calcination of films consisting of a mixture of vanadium oxides in hydrogen plasma enables the preparation of films of solely amorphous vanadium dioxide.

AB - Abstract: The work considers the synthesis of thin films of vanadium oxides by plasma-enhanced atomic layer deposition (PE-ALD). A procedure is proposed to obtain thin films of amorphous vanadium dioxide. The hydrogen effect on the composition of deposited films during PE-ALD is analyzed. Hydrogen is shown to decrease the vanadium oxidation state in the deposited films and amorphize the structure. The mechanism of amorphization is discussed. The application of plasma enhancement promotes the hydrogen reducing activity. Calcination of films consisting of a mixture of vanadium oxides in hydrogen plasma enables the preparation of films of solely amorphous vanadium dioxide.

KW - atomic layer deposition

KW - thin films

KW - vanadium oxides

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85209791554&origin=inward&txGid=1e45bb6d8f74817c6e7a2562c459909a

UR - https://www.mendeley.com/catalogue/aef924f6-e71b-3142-a029-5d9b9af4ac31/

U2 - 10.1134/S0022476624100160

DO - 10.1134/S0022476624100160

M3 - Article

VL - 65

SP - 2073

EP - 2087

JO - Journal of Structural Chemistry

JF - Journal of Structural Chemistry

SN - 0022-4766

IS - 10

ER -

ID: 61114910