Research output: Contribution to journal › Article › peer-review
Weak antilocalization to weak localization transition in Bi2Se3 films on graphene. / Stepina, N. P.; Golyashov, V. A.; Nenashev, A. V. et al.
In: Physica E: Low-Dimensional Systems and Nanostructures, Vol. 135, 114969, 01.2022.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Weak antilocalization to weak localization transition in Bi2Se3 films on graphene
AU - Stepina, N. P.
AU - Golyashov, V. A.
AU - Nenashev, A. V.
AU - Tereshchenko, O. E.
AU - Kokh, K. A.
AU - Kirienko, V. V.
AU - Koptev, E. S.
AU - Goldyreva, E. S.
AU - Rybin, M. G.
AU - Obraztsova, E. D.
AU - Antonova, I. V.
N1 - Funding Information: The authors thank Prof. L.E. Golub for the useful discussion. The work was supported by the grant of the Ministry of Science and Higher Education of the Russian Federation No. 075-15-2020-797 (13.1902.21.0024). Publisher Copyright: © 2021 Elsevier B.V.
PY - 2022/1
Y1 - 2022/1
N2 - Magneto-transport properties were studied on thin films of a 3D topological insulator (TI) Bi2Se3 grown on graphene (Gr) by physical vapor deposition. It was shown that the main contribution to the conductance is from the bulk states, whereas magnetoresistance is determined by both surface and bulk channels. The input of the charge transport over the surface states in the Si/SiO2/Gr/Bi2Se3 structure reveals itself in the weak antilocalization effect. The transition from a weak antilocalization to a weak localization is observed with decreasing the film thickness. The band bending on both interfaces makes it possible to explain the contribution to a weak antilocalization from different surfaces at different TI film thicknesses.
AB - Magneto-transport properties were studied on thin films of a 3D topological insulator (TI) Bi2Se3 grown on graphene (Gr) by physical vapor deposition. It was shown that the main contribution to the conductance is from the bulk states, whereas magnetoresistance is determined by both surface and bulk channels. The input of the charge transport over the surface states in the Si/SiO2/Gr/Bi2Se3 structure reveals itself in the weak antilocalization effect. The transition from a weak antilocalization to a weak localization is observed with decreasing the film thickness. The band bending on both interfaces makes it possible to explain the contribution to a weak antilocalization from different surfaces at different TI film thicknesses.
KW - Charge transport
KW - Surface states
KW - Topological insulator
KW - Weak antilocalization
UR - http://www.scopus.com/inward/record.url?scp=85115180791&partnerID=8YFLogxK
UR - https://www.elibrary.ru/item.asp?id=47067637
U2 - 10.1016/j.physe.2021.114969
DO - 10.1016/j.physe.2021.114969
M3 - Article
AN - SCOPUS:85115180791
VL - 135
JO - Physica E: Low-Dimensional Systems and Nanostructures
JF - Physica E: Low-Dimensional Systems and Nanostructures
SN - 1386-9477
M1 - 114969
ER -
ID: 34255936