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Weak antilocalization in partially relaxed 200-nm HgTe films. / Savchenko, M. L.; Kozlov, D. A.; Mikhailov, N. N. et al.

In: Physica E: Low-Dimensional Systems and Nanostructures, Vol. 129, 114624, 05.2021.

Research output: Contribution to journalArticlepeer-review

Harvard

Savchenko, ML, Kozlov, DA, Mikhailov, NN, Dvoretsky, SA & Kvon, ZD 2021, 'Weak antilocalization in partially relaxed 200-nm HgTe films', Physica E: Low-Dimensional Systems and Nanostructures, vol. 129, 114624. https://doi.org/10.1016/j.physe.2021.114624

APA

Savchenko, M. L., Kozlov, D. A., Mikhailov, N. N., Dvoretsky, S. A., & Kvon, Z. D. (2021). Weak antilocalization in partially relaxed 200-nm HgTe films. Physica E: Low-Dimensional Systems and Nanostructures, 129, [114624]. https://doi.org/10.1016/j.physe.2021.114624

Vancouver

Savchenko ML, Kozlov DA, Mikhailov NN, Dvoretsky SA, Kvon ZD. Weak antilocalization in partially relaxed 200-nm HgTe films. Physica E: Low-Dimensional Systems and Nanostructures. 2021 May;129:114624. doi: 10.1016/j.physe.2021.114624

Author

Savchenko, M. L. ; Kozlov, D. A. ; Mikhailov, N. N. et al. / Weak antilocalization in partially relaxed 200-nm HgTe films. In: Physica E: Low-Dimensional Systems and Nanostructures. 2021 ; Vol. 129.

BibTeX

@article{69736420a7444bd99aab31105685a088,
title = "Weak antilocalization in partially relaxed 200-nm HgTe films",
abstract = "The anomalous magnetoresistance caused by the weak antilocalization (WAL) effects in 200-nm HgTe films is experimentally studied. This system is a high quality 3D topological insulator that has much stronger spatial separation of surface states compare to previously studied thinner HgTe structures. However, in contrast to that films, the system under study is characterized by a reduced strain resulting in an almost zero bulk energy gap. It has been shown that at all positions of the Fermi level the system exhibits a positive conductivity correction superimposed on classical parabolic magnetoresistance. Since high mobility of carriers, the analysis of the obtained results was performed using a ballistic WAL theory. The maximum of the WAL conductivity correction amplitude was found at a Fermi level position near the bulk energy gap indicating to full decoupling of the surface carriers in these conditions. The WAL amplitude monotonously decreases when the density of either bulk electrons or holes increases that is caused by the increasing coupling between surface and bulk carriers.",
keywords = "3D TI, HgTe, Surface states, Weak localization",
author = "Savchenko, {M. L.} and Kozlov, {D. A.} and Mikhailov, {N. N.} and Dvoretsky, {S. A.} and Kvon, {Z. D.}",
note = "Funding Information: This work supported by RFBR Grant No. 18-42-543013 (together with the Government of the Novosibirsk Region of the Russian Federation). Publisher Copyright: {\textcopyright} 2021 Elsevier B.V. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.",
year = "2021",
month = may,
doi = "10.1016/j.physe.2021.114624",
language = "English",
volume = "129",
journal = "Physica E: Low-Dimensional Systems and Nanostructures",
issn = "1386-9477",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Weak antilocalization in partially relaxed 200-nm HgTe films

AU - Savchenko, M. L.

AU - Kozlov, D. A.

AU - Mikhailov, N. N.

AU - Dvoretsky, S. A.

AU - Kvon, Z. D.

N1 - Funding Information: This work supported by RFBR Grant No. 18-42-543013 (together with the Government of the Novosibirsk Region of the Russian Federation). Publisher Copyright: © 2021 Elsevier B.V. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.

PY - 2021/5

Y1 - 2021/5

N2 - The anomalous magnetoresistance caused by the weak antilocalization (WAL) effects in 200-nm HgTe films is experimentally studied. This system is a high quality 3D topological insulator that has much stronger spatial separation of surface states compare to previously studied thinner HgTe structures. However, in contrast to that films, the system under study is characterized by a reduced strain resulting in an almost zero bulk energy gap. It has been shown that at all positions of the Fermi level the system exhibits a positive conductivity correction superimposed on classical parabolic magnetoresistance. Since high mobility of carriers, the analysis of the obtained results was performed using a ballistic WAL theory. The maximum of the WAL conductivity correction amplitude was found at a Fermi level position near the bulk energy gap indicating to full decoupling of the surface carriers in these conditions. The WAL amplitude monotonously decreases when the density of either bulk electrons or holes increases that is caused by the increasing coupling between surface and bulk carriers.

AB - The anomalous magnetoresistance caused by the weak antilocalization (WAL) effects in 200-nm HgTe films is experimentally studied. This system is a high quality 3D topological insulator that has much stronger spatial separation of surface states compare to previously studied thinner HgTe structures. However, in contrast to that films, the system under study is characterized by a reduced strain resulting in an almost zero bulk energy gap. It has been shown that at all positions of the Fermi level the system exhibits a positive conductivity correction superimposed on classical parabolic magnetoresistance. Since high mobility of carriers, the analysis of the obtained results was performed using a ballistic WAL theory. The maximum of the WAL conductivity correction amplitude was found at a Fermi level position near the bulk energy gap indicating to full decoupling of the surface carriers in these conditions. The WAL amplitude monotonously decreases when the density of either bulk electrons or holes increases that is caused by the increasing coupling between surface and bulk carriers.

KW - 3D TI

KW - HgTe

KW - Surface states

KW - Weak localization

UR - http://www.scopus.com/inward/record.url?scp=85100079444&partnerID=8YFLogxK

U2 - 10.1016/j.physe.2021.114624

DO - 10.1016/j.physe.2021.114624

M3 - Article

AN - SCOPUS:85100079444

VL - 129

JO - Physica E: Low-Dimensional Systems and Nanostructures

JF - Physica E: Low-Dimensional Systems and Nanostructures

SN - 1386-9477

M1 - 114624

ER -

ID: 27650565