• G. P. Razuvaev
  • S. Bae
  • H. Choi
  • S. Choi
  • H. S. Ko
  • B. Kim
  • R. Kitamura
  • T. Mibe
  • M. Otani
Original languageEnglish
Article number09001
Number of pages7
JournalJournal of Instrumentation
Volume12
Issue number9
DOIs
Publication statusPublished - 4 Sept 2017

    OECD FOS+WOS

    Research areas

  • beam-intensity monitors, Beam-line instrumentation (beam position and profile monitors, bunch length monitors), Electron multipliers (vacuum), Beam-line instrumentation (beam position and profile monitors; beam-intensity monitors; bunch length monitors)

ID: 12671468