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The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel. / Zaitsev, D. V.; Tkachenko, E. M.; Bykovskaya, E. F.

In: Journal of Physics: Conference Series, Vol. 925, No. 1, 012030, 09.11.2017.

Research output: Contribution to journal › Article › peer-review

Harvard

Zaitsev, DV, Tkachenko, EM & Bykovskaya, EF 2017, 'The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel', Journal of Physics: Conference Series, vol. 925, no. 1, 012030. https://doi.org/10.1088/1742-6596/925/1/012030

APA

Zaitsev, D. V., Tkachenko, E. M., & Bykovskaya, E. F. (2017). The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel. Journal of Physics: Conference Series, 925(1), [012030]. https://doi.org/10.1088/1742-6596/925/1/012030

Vancouver

Zaitsev DV, Tkachenko EM, Bykovskaya EF. The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel. Journal of Physics: Conference Series. 2017 Nov 9;925(1):012030. doi: 10.1088/1742-6596/925/1/012030

Author

Zaitsev, D. V. ; Tkachenko, E. M. ; Bykovskaya, E. F. / The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel. In: Journal of Physics: Conference Series. 2017 ; Vol. 925, No. 1.

BibTeX

@article{db96ef7cb96247e6ac62542720d20832,
title = "The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel",
abstract = "Intensive evaporation of a thin liquid film, moving in a flat micro-/minichannel under the action of gas flow is very promising for the use in cooling systems of modern semiconductor devices with localized heat sources of high intensity. In this work, using the high-speed visualization, the effect of the formation of dry spots on heat transfer in a locally heated liquid film shear-driven in a channel was investigated. It was found that the maximum intensity of heat removal from the heater is achieved in the mode, when the film flow continuity is broken. During the experiment the total area of dry spots increases with increasing heat flux and heater temperature, but when the heater reaches a certain temperature (≈100°C), the total area begins to decrease. However, the length of contact line increases with increasing heat flux and reaches a maximum in the pre-crisis regime. Intensive evaporation in the region of the contact line may explain the achievement of high heat fluxes in the shear-driven liquid film.",
keywords = "DRIVEN, DYNAMICS",
author = "Zaitsev, {D. V.} and Tkachenko, {E. M.} and Bykovskaya, {E. F.}",
year = "2017",
month = nov,
day = "9",
doi = "10.1088/1742-6596/925/1/012030",
language = "English",
volume = "925",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "1",

}

RIS

TY - JOUR

T1 - The effect of dry spots on heat transfer in a locally heated liquid film moving under the action of gas flow in a channel

AU - Zaitsev, D. V.

AU - Tkachenko, E. M.

AU - Bykovskaya, E. F.

PY - 2017/11/9

Y1 - 2017/11/9

N2 - Intensive evaporation of a thin liquid film, moving in a flat micro-/minichannel under the action of gas flow is very promising for the use in cooling systems of modern semiconductor devices with localized heat sources of high intensity. In this work, using the high-speed visualization, the effect of the formation of dry spots on heat transfer in a locally heated liquid film shear-driven in a channel was investigated. It was found that the maximum intensity of heat removal from the heater is achieved in the mode, when the film flow continuity is broken. During the experiment the total area of dry spots increases with increasing heat flux and heater temperature, but when the heater reaches a certain temperature (≈100°C), the total area begins to decrease. However, the length of contact line increases with increasing heat flux and reaches a maximum in the pre-crisis regime. Intensive evaporation in the region of the contact line may explain the achievement of high heat fluxes in the shear-driven liquid film.

AB - Intensive evaporation of a thin liquid film, moving in a flat micro-/minichannel under the action of gas flow is very promising for the use in cooling systems of modern semiconductor devices with localized heat sources of high intensity. In this work, using the high-speed visualization, the effect of the formation of dry spots on heat transfer in a locally heated liquid film shear-driven in a channel was investigated. It was found that the maximum intensity of heat removal from the heater is achieved in the mode, when the film flow continuity is broken. During the experiment the total area of dry spots increases with increasing heat flux and heater temperature, but when the heater reaches a certain temperature (≈100°C), the total area begins to decrease. However, the length of contact line increases with increasing heat flux and reaches a maximum in the pre-crisis regime. Intensive evaporation in the region of the contact line may explain the achievement of high heat fluxes in the shear-driven liquid film.

KW - DRIVEN

KW - DYNAMICS

UR - http://www.scopus.com/inward/record.url?scp=85036465316&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/925/1/012030

DO - 10.1088/1742-6596/925/1/012030

M3 - Article

AN - SCOPUS:85036465316

VL - 925

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012030

ER -

ID: 9648303