• M. V. Filianina
  • I. I. Klimovskikh
  • I. A. Shvets
  • A. G. Rybkin
  • A. E. Petukhov
  • E. V. Chulkov
  • V. A. Golyashov
  • K. A. Kokh
  • O. E. Tereshchenko
  • C. Polley
  • T. Balasubramanian
  • M. Leandersson
  • A. M. Shikin
Original languageEnglish
Pages (from-to)253-258
Number of pages6
JournalMaterials Chemistry and Physics
Volume207
DOIs
Publication statusPublished - 1 Mar 2018

    Research areas

  • ARPES, Electronic structure, Topological insulators, SURFACE, BI2SE3, LAYER

    OECD FOS+WOS

ID: 10427240