Research output: Contribution to journal › Article › peer-review
Silicon kinoform cylindrical lens with low surface roughness for high-power terahertz radiation. / Kononenko, Taras V.; Knyazev, Boris A.; Sovyk, Dmitry N. et al.
In: Optics and Laser Technology, Vol. 123, 105953, 03.2020.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - Silicon kinoform cylindrical lens with low surface roughness for high-power terahertz radiation
AU - Kononenko, Taras V.
AU - Knyazev, Boris A.
AU - Sovyk, Dmitry N.
AU - Pavelyev, Vladimir S.
AU - Komlenok, Maxim S.
AU - Komandin, Gennadii A.
AU - Konov, Vitaly I.
N1 - Funding Information: The work was supported by Russian Ministry of Education and Science (Project 3.2608.2017/4.6). SEM investigations were carried out at D. Mendeleev Center for collective use of scientific equipment at D. Mendeleev University of Chemical Technology of Russia. Experiments on the Novosibirsk free electron laser were carried out using the equipment of the Siberian center of synchrotron and terahertz radiation. The authors thank O.E. Kameshkov for the numerical calculations. Publisher Copyright: © 2019 Elsevier Ltd Copyright: Copyright 2019 Elsevier B.V., All rights reserved.
PY - 2020/3
Y1 - 2020/3
N2 - Precise microstructuring of silicon with short laser pulses is a promising technique for fabrication of kinoform diffractive optical elements (DOEs) for high-power THz radiation. Micrometer-scale surface roughness being a typical result of the silicon microstructuring with laser is an important factor reducing optical performance of the fabricated DOEs. We demonstrate here that proper optimization of the processing conditions under profiling of high-resistance silicon surface by 1 ps laser pulses at λ = 1.03 μm allows formation of cylindrical Fresnel lens with the surface roughness of 0.5–1.2 µm being one order of magnitude smaller than reported earlier. Testing of the fabricated lens with a free electron laser at the wavelength of 141 μm has shown that the laser-machined silicon retains its original transmittance. Diffraction efficiency (0.93 ± 0.06) and deviation of the laser intensity profile in the lens focus from the theoretical expectations have been evaluated. Additionally, influence of the surface roughness on transmittance of the laser-machined silicon in the wavelength range of 95–400 μm was studied by means of time domain spectroscopy.
AB - Precise microstructuring of silicon with short laser pulses is a promising technique for fabrication of kinoform diffractive optical elements (DOEs) for high-power THz radiation. Micrometer-scale surface roughness being a typical result of the silicon microstructuring with laser is an important factor reducing optical performance of the fabricated DOEs. We demonstrate here that proper optimization of the processing conditions under profiling of high-resistance silicon surface by 1 ps laser pulses at λ = 1.03 μm allows formation of cylindrical Fresnel lens with the surface roughness of 0.5–1.2 µm being one order of magnitude smaller than reported earlier. Testing of the fabricated lens with a free electron laser at the wavelength of 141 μm has shown that the laser-machined silicon retains its original transmittance. Diffraction efficiency (0.93 ± 0.06) and deviation of the laser intensity profile in the lens focus from the theoretical expectations have been evaluated. Additionally, influence of the surface roughness on transmittance of the laser-machined silicon in the wavelength range of 95–400 μm was studied by means of time domain spectroscopy.
KW - DIFFRACTIVE OPTICS
KW - FRESNEL LENS
KW - FABRICATION
UR - http://www.scopus.com/inward/record.url?scp=85075473112&partnerID=8YFLogxK
U2 - 10.1016/j.optlastec.2019.105953
DO - 10.1016/j.optlastec.2019.105953
M3 - Article
AN - SCOPUS:85075473112
VL - 123
JO - Optics and Laser Technology
JF - Optics and Laser Technology
SN - 0030-3992
M1 - 105953
ER -
ID: 22428152