Silicide phase formation by Mg deposition on amorphous Si. Ab initio calculations, growth process and thermal stability

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	514-521
Number of pages	8
Journal	Journal of Alloys and Compounds
Volume	778
DOIs	https://doi.org/10.1016/j.jallcom.2018.11.225
Publication status	Published - 25 Mar 2019

Ab initio calculations, Electron energy loss spectroscopy, High resolution transmission electron spectroscopy, Optical reflection spectroscopy, Solid state reactions, Thin films, OPTICAL-PROPERTIES, PRINCIPLES, MG2SI, ELECTRONIC-STRUCTURES, PRESSURE, SPECTROSCOPY, TRANSITIONS, GE

ID: 17472325