Research output: Contribution to journal › Article › peer-review
Si-based light emitters synthesized with Ge+ ion bombardment. / Zinovyev, V. A.; Zinovieva, A. F.; Smagina, Zh V. et al.
In: Journal of Applied Physics, Vol. 130, No. 15, 153101, 21.10.2021.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Si-based light emitters synthesized with Ge+ ion bombardment
AU - Zinovyev, V. A.
AU - Zinovieva, A. F.
AU - Smagina, Zh V.
AU - Dvurechenskii, A. V.
AU - Vdovin, V. I.
AU - Gutakovskii, A. K.
AU - Fedina, L. I.
AU - Borodavchenko, O. M.
AU - Zhivulko, V. D.
AU - Mudryi, A. V.
N1 - Funding Information: This work is funded by the Russian Science Foundation (No. 19-12-00070) in the part of the synthesis of Ge/Si structures with Ge ion bombardment. The photoluminescence study was supported by the Belarussian Republican Foundation for Fundamental Research (Project No. F20R-092) and RFBR (Project No. 20-52-00016). HRTEM investigations using the equipment of ISP Center of shared-use facility “Nanostructures” were funded by RSF project No. 19-72-30023. The authors gratefully acknowledge V. A. Armbrister for the growth of experimental structures. Publisher Copyright: © 2021 Author(s).
PY - 2021/10/21
Y1 - 2021/10/21
N2 - The photoluminescence (PL) of Ge/Si nanostructures synthesized by using Ge ion bombardment is studied. The structure represents a Si substrate with GeSi nanoclusters created by 80 keV Ge implantation with a fluence of and subsequent thermal annealing. The PL measurements confirm the advantage of Ge/Si structures synthesized using Ge ion bombardment over the usual epitaxial structures with GeSi quantum dots. The presence of defects produced by Ge implantation results in pronounced PL at telecom wavelengths up to room temperature. The results provide a basis for creating efficient light emitters compatible with the existing Si technology.
AB - The photoluminescence (PL) of Ge/Si nanostructures synthesized by using Ge ion bombardment is studied. The structure represents a Si substrate with GeSi nanoclusters created by 80 keV Ge implantation with a fluence of and subsequent thermal annealing. The PL measurements confirm the advantage of Ge/Si structures synthesized using Ge ion bombardment over the usual epitaxial structures with GeSi quantum dots. The presence of defects produced by Ge implantation results in pronounced PL at telecom wavelengths up to room temperature. The results provide a basis for creating efficient light emitters compatible with the existing Si technology.
UR - http://www.scopus.com/inward/record.url?scp=85117202188&partnerID=8YFLogxK
U2 - 10.1063/5.0063592
DO - 10.1063/5.0063592
M3 - Article
AN - SCOPUS:85117202188
VL - 130
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 15
M1 - 153101
ER -
ID: 34464575