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Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field. / Kozlov, D. A.; Ziegler, J.; Mikhailov, N. N. et al.

In: JETP Letters, Vol. 109, No. 12, 01.06.2019, p. 799-805.

Research output: Contribution to journalArticlepeer-review

Harvard

Kozlov, DA, Ziegler, J, Mikhailov, NN, Dvoretskii, SA & Weiss, D 2019, 'Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field', JETP Letters, vol. 109, no. 12, pp. 799-805. https://doi.org/10.1134/S0021364019120051

APA

Kozlov, D. A., Ziegler, J., Mikhailov, N. N., Dvoretskii, S. A., & Weiss, D. (2019). Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field. JETP Letters, 109(12), 799-805. https://doi.org/10.1134/S0021364019120051

Vancouver

Kozlov DA, Ziegler J, Mikhailov NN, Dvoretskii SA, Weiss D. Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field. JETP Letters. 2019 Jun 1;109(12):799-805. doi: 10.1134/S0021364019120051

Author

Kozlov, D. A. ; Ziegler, J. ; Mikhailov, N. N. et al. / Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field. In: JETP Letters. 2019 ; Vol. 109, No. 12. pp. 799-805.

BibTeX

@article{7335fadf32ae42bc8cc173c9a85dc156,
title = "Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field",
abstract = "Specific features in the formation of Landau levels in a three-dimensional topological insulator based on an 80-nm-thick strained mercury telluride film in an inclined magnetic field are studied. The magnetoresistance in the Hall bar geometry with a gate is measured at a temperature 1.9 K and in an applied magnetic field up to 10 T. The gate allows varying the Fermi level position from the valence to conduction band, passing through the bulk band gap. The samples are mounted on a rotating platform that makes it possible to change arbitrarily the angle between the magnetic field direction and the normal to the sample plane within the range of 0°–90°. It is found that the Shubnikov–de Haas oscillations are formed if the perpendicular magnetic field component exceeds 0.4 T, independent of the applied gate voltage. However, the sensitivity of the system to the parallel magnetic field component exhibits a pronounced dependence on the applied gate voltage. Namely, if the Fermi level is in the bulk band gap and the conductivity is determined by the surface states, the amplitude and position of Shubnikov–de Haas oscillations remain independent of the perpendicular magnetic field component even in the situation where the parallel component is twice as large as the perpendicular one. At high magnetic fields, the amplitude of oscillations is suppressed by the parallel field component. On the contrary, if the Fermi level is in the valence or conduction band, the parallel field component not only affects the amplitude of oscillations but also results even in their qualitative changes, e.g., giving rise to new minima related to Zeeman splitting. The observed behavior of the system is in agreement with the modern concepts concerning the spin polarization of the surface state in three-dimensional topological insulators and the spin degeneracy of charge carriers in the bulk.",
keywords = "QUANTUM-WELLS, CONDUCTION-BAND, SURFACE",
author = "Kozlov, {D. A.} and J. Ziegler and Mikhailov, {N. N.} and Dvoretskii, {S. A.} and D. Weiss",
year = "2019",
month = jun,
day = "1",
doi = "10.1134/S0021364019120051",
language = "English",
volume = "109",
pages = "799--805",
journal = "JETP Letters",
issn = "0021-3640",
publisher = "MAIK NAUKA/INTERPERIODICA/SPRINGER",
number = "12",

}

RIS

TY - JOUR

T1 - Shubnikov—de Haas Oscillations in a Three-Dimensional Topological Insulator Based on a Strained HgTe Film in an Inclined Magnetic Field

AU - Kozlov, D. A.

AU - Ziegler, J.

AU - Mikhailov, N. N.

AU - Dvoretskii, S. A.

AU - Weiss, D.

PY - 2019/6/1

Y1 - 2019/6/1

N2 - Specific features in the formation of Landau levels in a three-dimensional topological insulator based on an 80-nm-thick strained mercury telluride film in an inclined magnetic field are studied. The magnetoresistance in the Hall bar geometry with a gate is measured at a temperature 1.9 K and in an applied magnetic field up to 10 T. The gate allows varying the Fermi level position from the valence to conduction band, passing through the bulk band gap. The samples are mounted on a rotating platform that makes it possible to change arbitrarily the angle between the magnetic field direction and the normal to the sample plane within the range of 0°–90°. It is found that the Shubnikov–de Haas oscillations are formed if the perpendicular magnetic field component exceeds 0.4 T, independent of the applied gate voltage. However, the sensitivity of the system to the parallel magnetic field component exhibits a pronounced dependence on the applied gate voltage. Namely, if the Fermi level is in the bulk band gap and the conductivity is determined by the surface states, the amplitude and position of Shubnikov–de Haas oscillations remain independent of the perpendicular magnetic field component even in the situation where the parallel component is twice as large as the perpendicular one. At high magnetic fields, the amplitude of oscillations is suppressed by the parallel field component. On the contrary, if the Fermi level is in the valence or conduction band, the parallel field component not only affects the amplitude of oscillations but also results even in their qualitative changes, e.g., giving rise to new minima related to Zeeman splitting. The observed behavior of the system is in agreement with the modern concepts concerning the spin polarization of the surface state in three-dimensional topological insulators and the spin degeneracy of charge carriers in the bulk.

AB - Specific features in the formation of Landau levels in a three-dimensional topological insulator based on an 80-nm-thick strained mercury telluride film in an inclined magnetic field are studied. The magnetoresistance in the Hall bar geometry with a gate is measured at a temperature 1.9 K and in an applied magnetic field up to 10 T. The gate allows varying the Fermi level position from the valence to conduction band, passing through the bulk band gap. The samples are mounted on a rotating platform that makes it possible to change arbitrarily the angle between the magnetic field direction and the normal to the sample plane within the range of 0°–90°. It is found that the Shubnikov–de Haas oscillations are formed if the perpendicular magnetic field component exceeds 0.4 T, independent of the applied gate voltage. However, the sensitivity of the system to the parallel magnetic field component exhibits a pronounced dependence on the applied gate voltage. Namely, if the Fermi level is in the bulk band gap and the conductivity is determined by the surface states, the amplitude and position of Shubnikov–de Haas oscillations remain independent of the perpendicular magnetic field component even in the situation where the parallel component is twice as large as the perpendicular one. At high magnetic fields, the amplitude of oscillations is suppressed by the parallel field component. On the contrary, if the Fermi level is in the valence or conduction band, the parallel field component not only affects the amplitude of oscillations but also results even in their qualitative changes, e.g., giving rise to new minima related to Zeeman splitting. The observed behavior of the system is in agreement with the modern concepts concerning the spin polarization of the surface state in three-dimensional topological insulators and the spin degeneracy of charge carriers in the bulk.

KW - QUANTUM-WELLS

KW - CONDUCTION-BAND

KW - SURFACE

UR - http://www.scopus.com/inward/record.url?scp=85071326419&partnerID=8YFLogxK

U2 - 10.1134/S0021364019120051

DO - 10.1134/S0021364019120051

M3 - Article

AN - SCOPUS:85071326419

VL - 109

SP - 799

EP - 805

JO - JETP Letters

JF - JETP Letters

SN - 0021-3640

IS - 12

ER -

ID: 21346455