• V. G. Mansurov
  • Yu G. Galitsyn
  • T. V. Malin
  • S. A. Teys
  • E. V. Fedosenko
  • A. S. Kozhukhov
  • K. S. Zhuravlev
  • Ildikó Cora
  • Béla Pécz
Original languageEnglish
Pages (from-to)1511-1517
Number of pages7
JournalSemiconductors
Volume52
Issue number12
DOIs
Publication statusPublished - 1 Dec 2018

    OECD FOS+WOS

    Research areas

  • SILICON-NITRIDE, ELECTRONIC-STRUCTURE, CRYSTAL-STRUCTURE, BETA-SI3N4, ADSORPTION, DEPOSITION, KINETICS, AMMONIA, ORIGIN, FILM

ID: 17408172