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Evaporation of microdroplet on a heated plate at 408 K. / Gatapova, E. Y.

In: Journal of Physics: Conference Series, Vol. 1105, No. 1, 012137, 28.11.2018.

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Harvard

Gatapova, EY 2018, 'Evaporation of microdroplet on a heated plate at 408 K', Journal of Physics: Conference Series, vol. 1105, no. 1, 012137. https://doi.org/10.1088/1742-6596/1105/1/012137

APA

Vancouver

Gatapova EY. Evaporation of microdroplet on a heated plate at 408 K. Journal of Physics: Conference Series. 2018 Nov 28;1105(1):012137. doi: 10.1088/1742-6596/1105/1/012137

Author

Gatapova, E. Y. / Evaporation of microdroplet on a heated plate at 408 K. In: Journal of Physics: Conference Series. 2018 ; Vol. 1105, No. 1.

BibTeX

@article{6487b8dea4ad4c79875813338e980577,
title = "Evaporation of microdroplet on a heated plate at 408 K",
abstract = "Droplet-based cooling systems require a detailed data on droplet evaporation at relatively high substrate temperature. We investigate the dynamics of water droplet evaporation on a heated sapphire substrate for the substrate temperature of 408 K. The stable (not boiling) evaporating droplet of 0.33 μl volume forms immediately just after boiling process when the temperature is still higher than boiling temperature of the liquid. Stick-slip motion is observed with the first depinning at 0.07 μl in volume. Total evaporation time is 1.13 sec.",
keywords = "WATER DROP, SURFACE",
author = "Gatapova, {E. Y.}",
year = "2018",
month = nov,
day = "28",
doi = "10.1088/1742-6596/1105/1/012137",
language = "English",
volume = "1105",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "1",
note = "34th Siberian Thermophysical Seminar Dedicated to the 85th Anniversary of Academician A. K. Rebrov, STS 2018 ; Conference date: 27-08-2018 Through 30-08-2018",

}

RIS

TY - JOUR

T1 - Evaporation of microdroplet on a heated plate at 408 K

AU - Gatapova, E. Y.

PY - 2018/11/28

Y1 - 2018/11/28

N2 - Droplet-based cooling systems require a detailed data on droplet evaporation at relatively high substrate temperature. We investigate the dynamics of water droplet evaporation on a heated sapphire substrate for the substrate temperature of 408 K. The stable (not boiling) evaporating droplet of 0.33 μl volume forms immediately just after boiling process when the temperature is still higher than boiling temperature of the liquid. Stick-slip motion is observed with the first depinning at 0.07 μl in volume. Total evaporation time is 1.13 sec.

AB - Droplet-based cooling systems require a detailed data on droplet evaporation at relatively high substrate temperature. We investigate the dynamics of water droplet evaporation on a heated sapphire substrate for the substrate temperature of 408 K. The stable (not boiling) evaporating droplet of 0.33 μl volume forms immediately just after boiling process when the temperature is still higher than boiling temperature of the liquid. Stick-slip motion is observed with the first depinning at 0.07 μl in volume. Total evaporation time is 1.13 sec.

KW - WATER DROP

KW - SURFACE

UR - http://www.scopus.com/inward/record.url?scp=85058212935&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1105/1/012137

DO - 10.1088/1742-6596/1105/1/012137

M3 - Conference article

AN - SCOPUS:85058212935

VL - 1105

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012137

T2 - 34th Siberian Thermophysical Seminar Dedicated to the 85th Anniversary of Academician A. K. Rebrov, STS 2018

Y2 - 27 August 2018 through 30 August 2018

ER -

ID: 23777600