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Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films

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Laboratory of functional diagnostics of low-dimensional structures for nanoelectronics

DOI

https://doi.org/10.3897/j.moem.9.2.109980
Final published version

Konstantin V. Feklistov
Aleksey G. Lemzyakov
Alexander A. Shklyaev
Dmitry Yu. Protasov
Alexander S. Deryabin
Evgeny V. Spesivsev
Dmitry V. Gulyaev
Alexey M. Pugachev
Dmitriy G. Esaev

Original language	English
Pages (from-to)	57-68
Number of pages	12
Journal	Modern Electronic Materials
Volume	9
Issue number	2
DOIs	https://doi.org/10.3897/j.moem.9.2.109980
Publication status	Published - 2023

OECD FOS+WOS

1.03 PHYSICAL SCIENCES AND ASTRONOMY

ID: 59179212