Effect of terminal methyl groups concentration on properties of organosilicate glass low dielectric constant films

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	07MC01
Number of pages	7
Journal	Japanese Journal of Applied Physics
Volume	57
Issue number	7
DOIs	https://doi.org/10.7567/JJAP.57.07MC01
Publication status	Published - 1 Jul 2018

CHEMICAL-VAPOR-DEPOSITION, LOW-K FILMS, TRANSFORM INFRARED-SPECTROSCOPY, SILICON-OXIDE FILMS, THIN-FILMS, ELLIPSOMETRIC POROSIMETRY, SICOH FILMS, PORE-SIZE, PLASMA, PECVD

ID: 14316689