Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	S78-S89
Number of pages	12
Journal	Journal of Surface Investigation
Volume	17
Issue number	Suppl 1
DOIs	https://doi.org/10.1134/S1027451023070091
Publication status	Published - Dec 2023

Kirkpatrick–Baez mirrors, Laue diffraction, X-ray diffraction, X-ray imaging, XAFS, double-mirror multilayer monochromator, extended undulator harmonics, in situ, materials science, quadruple-crystal monochromator, submicrometer focusing, synchrotron radiation

ID: 59755142