• L. S. Basalaeva
  • Yu V. Nastaushev
  • F. N. Dultsev
Original languageEnglish
Pages (from-to)11341-11345
Number of pages5
JournalMaterials Today: Proceedings
Volume4
Issue number11
DOIs
Publication statusPublished - 1 Jan 2017

    OECD FOS+WOS

    Research areas

  • Nanolithography, Plasma etching, Silicon nanopillars, nanolithography, silicon nanopillars, NANOWIRES, plasma etching

ID: 9874854