TY - JOUR

T1 - A concept of "materials" diffraction and imaging beamline for SKIF: Siberian circular photon source

AU - Chernov, Vladimir A

AU - Bataev, Ivan A

AU - Rakshun, Yakov V

AU - Khomyakov, Yuri V

AU - Gorbachev, Maksim V

AU - Trebushinin, Andrei E

AU - Chkhalo, Nikolay I

AU - Krasnorutskiy, Dmitry A

AU - Naumkin, Viktor S

AU - Sklyarov, Artem N

AU - Mezentsev, Nikolay A

AU - Korsunsky, Alexander M

AU - Dolbnya, Igor P

PY - 2023/1/1

Y1 - 2023/1/1

N2 - Over the next decade, the extremely brilliant fourth generation synchrotron radiation sources are set to become a key driving force in materials characterization and technology development. In this study, we present a conceptual design of a versatile "Materia" diffraction and imaging beamline for a low-emittance synchrotron radiation facility. The beamline was optimized for operation with three main principal delivery regimes: parallel collimated beam ∼1 mm beam size, micro-focus regime with ∼10 μm beam spot size on the sample, and nano-focus regime with <100 nm focus. All regimes will operate in the photon energy range of 10-30 keV with the key feature of the beamline being fast switching between them, as well as between the various realizations of diffraction and imaging operation modes while maintaining the target beam position at the sample, and with both spectrally narrow and spectrally broad beams up to the energy band ΔE/E of 5 × 10-2. The manuscript presents the details of the principal characteristics selected for the insertion device and beamline optics, the materials characterization techniques, including the simulations of thermal load impact on the critical beamline optics components. Significant efforts were made to design the monochromators to mitigate the very high beam power load produced by a superconducting undulator source. The manuscript will be of interest to research groups involved in the design of new synchrotron beamlines.

AB - Over the next decade, the extremely brilliant fourth generation synchrotron radiation sources are set to become a key driving force in materials characterization and technology development. In this study, we present a conceptual design of a versatile "Materia" diffraction and imaging beamline for a low-emittance synchrotron radiation facility. The beamline was optimized for operation with three main principal delivery regimes: parallel collimated beam ∼1 mm beam size, micro-focus regime with ∼10 μm beam spot size on the sample, and nano-focus regime with <100 nm focus. All regimes will operate in the photon energy range of 10-30 keV with the key feature of the beamline being fast switching between them, as well as between the various realizations of diffraction and imaging operation modes while maintaining the target beam position at the sample, and with both spectrally narrow and spectrally broad beams up to the energy band ΔE/E of 5 × 10-2. The manuscript presents the details of the principal characteristics selected for the insertion device and beamline optics, the materials characterization techniques, including the simulations of thermal load impact on the critical beamline optics components. Significant efforts were made to design the monochromators to mitigate the very high beam power load produced by a superconducting undulator source. The manuscript will be of interest to research groups involved in the design of new synchrotron beamlines.

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85146896009&origin=inward&txGid=11d726b784aa0534a345d14a307ff96b

UR - https://www.elibrary.ru/item.asp?id=50369360

U2 - 10.1063/5.0103481

DO - 10.1063/5.0103481

M3 - Article

C2 - 36725606

VL - 94

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 1

M1 - 013305

ER -