Original languageEnglish
Pages (from-to)188-195
Number of pages8
JournalJournal of Crystal Growth
Volume457
DOIs
Publication statusPublished - 1 Jan 2017

    OECD FOS+WOS

    Research areas

  • A1. Morphological stability, A1. Nucleation, A1. Surface processes, A3. Molecular beam epitaxy, B2. Semiconducting silicon, MOLECULAR-BEAM, ATOMIC PROCESSES, Nucleation, MAGIC ISLANDS, Morphological stability, HOMOEPITAXY, SUBMONOLAYER EPITAXY, 2-DIMENSIONAL NUCLEATION, TEMPERATURES, KINETICS, Molecular beam epitaxy, Semiconducting silicon, SCANNING-TUNNELING-MICROSCOPY, THIN-FILM GROWTH, Surface processes

ID: 10319890